ShanghaiTech and SSRF Host 4th AP-XPS Workshop
Author:School of Physical Science and Technology            Date:2018-01-04            Browse:452

ShanghaiTech University and Shanghai Synchrotron Radiation Facility hosted the 4th Annual Workshop on Ambient Pressure X-ray Photoelectron Spectroscopy (AP-XPS), at ShanghaiTech on Dec. 13-15.

 

ShanghaiTech Vice President Professor Gong Jinkang, and Shanghai Institute of Applied Physics Deputy Director Professor Tai Renzhong gave opening remarks. They welcomed scientists from all over the world to ShanghaiTech University, and wished them an enjoyable stay in Shanghai and a fruitful experience at the workshop.

 

Professor Liu Zhi from the School of Physical Science and Technology and Dr. Ethan Crumlin from Lawrence Berkeley National Laboratory served as the Co-Chairs of this three-day workshop. The workshop covered four research areas: catalysis, electrochemistry, advanced instrumentation and interfaces. More than 30 scientists presented their works. The workshop attracted more than 150 international and domestic scientists to attend and present their newest results.

 

In two keynote speeches, Professor Bao Xinhe, President of University of Science and Technology of China, presented the application of AP-XPS in the development of new catalysts and catalytic processes related to energy conversion, in particular clean coal and natural gas utilization. Dr. Zahid Hussain, Division Deputy of Scientific Support at Lawrence Berkeley National Laboratory, reviewed the origin and development of modern AP-XPS. Talks by ten invited speakers and more than 20 talks by contributors were also given during the workshop. During their talks, researchers presented the newest developments in AP-XPS field and the applications of AP-XPS in different research fields such as homogeneous catalysis, electro catalysis, and solid-liquid interface characterization, etc.

 

The poster from German Erlangen-Nürnberg scientist Olaf Brummel was awarded as the Best Poster. Cai Jun from ShanghaiTech University, Yang Tian from CAS SIMIT and Chia-Hsuan Lin from NSRRC won Excellent Poster awards.   

 

The 4th Annual Workshop on Ambient Pressure X-ray Photoelectron Spectroscopy, held since 2014, is the largest conference in this field and aims to promote exchanges and cooperation among scientists in various disciplines. The previous three were successfully held in Paris, France in 2014, Berkeley, US in 2015, and Oxford, UK in 2016. The next workshop will be held in Berlin, Germany in 2018.